EurekAlert!: Single-beam optical trap-based surface-enhanced raman scattering optofluidic molecular fingerprint spectroscopy detection system
Single-beam optical trap-based surface-enhanced raman scattering optofluidic molecular fingerprint spectroscopy detection system
EurekAlert!: Novel image-based model enhances the detection of surface defects in low-light industrial settings
Novel image-based model enhances the detection of surface defects in low-light industrial settings
Optical surface defect inspection and imaging techniques are pivotal to ensuring high-performance outcomes across a myriad of applications including semiconductor manufacturing, precision optics, and ...
Figure 1. (a) Schematic diagram of the optical trapping-enhanced SERS optofluidic detection system; (b) effect of the single-beam optical trap module switch state on AgNPs aggregation; (c1) and (c2) ...
Researchers have designed a robust image-based anomaly detection (AD) framework with illumination enhancement and noise suppression features that can enhance the detection of subtle defects in ...
Advancements in structured illumination and computational imaging are revolutionizing semiconductor wafer inspection, enabling detection of sub-10 nm defects.
EurekAlert!: Optical wafer defect inspection at the 10 nm technology node and beyond
Optical wafer defect inspection at the 10 nm technology node and beyond
AZOM: Non-Contact Optical Profiling and Surface Metrology for Researchers in Industry and Academia
Non-Contact Optical Profiling and Surface Metrology for Researchers in Industry and Academia
Semiconductor Engineering: Criticality of Wafer Edge Inspection and Metrology Data to All-Surface Defectivity Root Cause and Yield Analysis
Criticality of Wafer Edge Inspection and Metrology Data to All-Surface Defectivity Root Cause and Yield Analysis
Defect detection requirements on the order of 10 defective parts per million (DPPM) are driving improvements in inspection tools’ resolution and throughput at foundries and OSATs. However, defects ...